Make:
SIC Bromont
Model:
---
category:
Wet Etching
contact:
zhao.lu@mcgill.ca
location:
Etch/Dep room
install:
Sun, 01/01/2006
Coral Name:
wb-si-etch
Description:
Wet bench dedicated to bulk silicon etching. TMAH and KOH chemistry only. Introduction
Associated documents and references
TMAH MSDS
KOH MSDS
Equipment used and safety considerations
- Silicon wet etch sink
- Always wear the personnel protective equipment when working at the sink
Verification prior to processing
Prior to processing you need to:
- plan your experiment and the time needed for the etch. Often time, etches can last several hours and can be done when the fab is closed. Plan accordingly.
- The bath is kept at room temperature when not in use. Allow 1 hour for it to reach the operating temperature of 85°C
- A 30-min etch rate test is preferable before etching your real sample.
Processing step
- Turn on the heater by pressing the "Hold" key
- Wait at least one hour for the bath to heat and stabilize
- Set the right-hand side timer to the appropriate time
- Place your sample into a teflon cassette or holder equipped with a sufficiently long handle to allow secure diving of the assembly in the tank
- Using the handle, dive your samle + holder in the tank and start the timer above
- Close lid and start timer.
- When etch time is over, remove teflon holder or cassette from bath and put in the quick dump rinser. Press Reset and Start on the QDR control panel to initiate a rinse cycle. Use the gooseneck for small samples.
- Turn off the bath heater by pressing "hold"
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