Seminar and hands on demo: Heidelberg Instrument: Thermal scanning probe lithography technology (NanoFrazor-tSPL) May 26, 1pm to 5pm

Workshops

Here it is the schedule:

Address: Room 105, Rutherford Physics Building, 3600 University street, Montreal

Time:

13:00 - 14:00: presentation, Q&A session

14:00 - 16:00: demonstraton in cleanroom (everybody needs bunny suits provided by the lab, no shorts and open shoes)

Dear Nanotools Users,

Our Nanofrazor system will have a major upgrade in this month. Engineer from Heidelberg will give a presentation regarding their unique technology, new capability and process development on the system. Here it is the short list of the capability of the Nanofrazor, the highlighted parts are the new features after the upgrade. You can find the details of the presentaion in the attached document.

Detailed schedule will be annouced shortly.

All existing nanotools users are welcomed and feel free to spread the message. If you are interested, please send me an email to confirm to your attendence.

Regards

Zhao

Main Features:

High-resolution

Easy patterning of nanostructures even with complex geometries; min. lateral features 15 nm, Vertical resolution 2 nm

Thermal Scanning Probe Lithography

New approach to nanopatterning enabling applications not otherwise feasible

Non-invasive Lithography

No damage from charged particles, no proximity effects, clean lift-off

Compatibility

With all standard pattern transfer methods: lift-off, etching, etc – knowledge resource and best practices available in our “Recipe Book”

In-situ Imaging

Immediate control of patterned structures

Precise Overlay and Stitching

Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown

Unique Thermal Cantilevers

Integrated microheater and distance sensor; easy to exchange and economical

Laser Sublimation Module

High-throughput exposure of coarse structures in the same exposure step; 405 nm wavelength CW fiber laser