Protocol
- Get 2 Silicon 6inch wafers. Wafers can be resused by etching away the deposited layer using the right chemical.
- Get the 6inch pallet and place one wafer in the top left position (TL) and one wafer in the bottom right position (BR)
- Use a sharpie pen to make marks @ 5 locations on each wafers: T, C, B, L, R
- Run the process
- With a swab and acetone, lift-off the sharpie pen ink and measure steps with the profilometer (XP200)
- Record data in Coral and on website
Chromium deposition
Recipe target: 2000A
Gas | Power | Pressure | ScanSpeed | PreSputt | # scans | Vacuum |
1: Ar | 2.15 kW | 10mT | 100cm/min | 1min | 5 | 8.0 e-7 |
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Date | Time to Vac. | Wafer | T | C | B | L | R | AVE | UNIF |
21/03/11 | 15min | WaferTL | 1713 | 1884 | 1788 | 1732 | 2098 | 1843 | 8.53% |
21/03/11 | 15min | WaferBR | 1586 | 1986 | 1887 | 2375 | 2480 | 2062.8 | 17.74% |
Aluminum Deposition
Recipe target: 2000A
Gas | Power | Pressure | ScanSpeed | PreSputt | # scans | Vacuum |
1: Ar | 2.57 kW | 10mT | 20cm/min | 1min | 1 | 8.0 e-7 |
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Date | Time to Vac. | Wafer | T | C | B | L | R | AVE | UNIF |
21/03/11 | 15min | WaferTL | 1951 | 2164 | 1758 | 2175 | 2108 | 2031.2 | 8.71% |
21/03/11 | 15min | WaferBR | 2015 | 2033 | 2265 | 2147 | 2300 | 2152 | 6.04% |
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