Metrology monitoring

NANOSPEC 

SPC Wafer: Laser Mark = 29200XH430016

Description: 100 mm Silicon wafer - orientation (100) - with thermal oxide

PRGM 1 @ 10 X after referencing to blank silicon reference wafer

 


Date Data1 Data2 Data3 Data4 Data5 Data6 Data7 Data8 Data9 Data10   Day # Xbar Range Stdev
19-mars-10 18433 18432 18433 18433 18432 18433 18433 18432 18432 18433   1 18432,6 1,0 0,5
26-mars-10 18430 18430 18429 18428 18430 18428 18430 18430 18428 18431   8 18429,4 3,0 1,1
07/10/10 18630 18629 18629 18630 18631 18629 18630 18625 18630 18629   203 18629,2 6,0 1,6

 

Ambios XP200

Calibration Standard s/n 039 - 200 um wide step across "dog bone" feature - nominal height 1 um; Ambios measured height 10867 Angstroms

Scan Parameters

Speed 0,10

Length 1,0

Range 2,5

F/R Forward

Force 8,0

Filter Level 8

Units nm