Introduction
This article describes the process of preparing microfluidic channels etched in glass. The channels are formed by HF based wet etch of borosilicate glass (Pyrex or Borofloat). As such the channels will have semi-circular shaped sidewalls.
Associated documents and references
Equipment needed
Process run card
Step |
Clean |
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Machine |
Wbgen-nonhf |
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Process |
10min in Nanostrip @ 90°C |
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Comments |
Disposal of nanostrip: wait for solution to cool down and dump it into a bath of running water. Rinse your dish under DIW. |
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Done date |
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Step |
aSi growth |
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Machine |
LPCVD Tylan |
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Process |
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Comments |
Use polysilicon boat |
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Done date |
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Step |
Measure aSi thickness |
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Machine |
SOPRA Ellipsometer: |
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Process |
aSi on glass @ 57° |
Wafer ID |
aSi thickness (nm) |
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Comments |
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Done date |
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Step |
Photolithography |
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Machine |
EVG620 – SiteCoat– Yes Oven |
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Process |
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Comments |
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Done date |
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Step |
Etch aSi |
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Machine |
AMAT P5000 |
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Process |
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Comments |
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Done date |
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Step |
Glass Etch |
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Machine |
Acid HF bench |
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Process |
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Comments |
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Done date |
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Step |
inspection |
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Machine |
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Process |
Inspec all wafers for defects and remaining silicon. Redo TMAH in case of remaining aSi. |
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Comments |
Wafer ID |
Cavity Depth in µm |
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Done date |
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