Gold deposition
Results for Denton E14 Gold deposition monitoring with Recipe AU-MON1-PH Pressure = 5 mTorr DC1 = 0.2 Amperes RS = 50% Heat = NO Measurement Method = Profilometry of scratch test on glass slide
DATE | TIME (sec) | THICKNESS (A) | RATE (A/sec) | Comments |
---|---|---|---|---|
20-Mar-09 | 417 | 1259 | 3.02 | |
31-Mar-09 | 723 | 3022 | 4.18 | |
05-May-09 | 723 | 3093 | 4.28 | |
07-Jul-09 | 100 | 422 | 4.22 | |
28-Aug-09 | 300 | 1053 | 3.51 | |
28-Jan-10 | 300 | 1033 | 3.44 | |
26-Apr-10 | 300 | 1175 | 3.92 | |
09-Jun-10 | 600 | 2139 | 3.57 | |
20-Aug-10 | 300 | 1379 | 4.59 | New Target |
24-Mar-11 | 300 | 1450 | 4.8 | |
20-Jun-11 | 300 | 1280 | 4.26 | |
07-Oct-11 | 300 | 1220 | 4.06 | |
13-Dec-11 | 300 | 1200 | 4.00 | |
26-Jan-12 | 300 | 1200 | 4.00 | |
19-July-16 | 900 | 3400 | 3.8 |
Titanium Deposition
Results for Denton E14 Titanium deposition monitoring with Recipe TI-MON1-PH Pressure = 8 mTorr DC2 = 0.6 Amperes RS = 50% Heat = NO Measurement Method = Profilometry of resist pen test on glass slide
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) |
---|---|---|---|
5-May-09 | 600 | 1093 | 1.82 |
7-Jul-09 | 600 | 856 | 1.43 |
26-Aug-09 | 900 | 1366 | 1.52 |
28-Jan-10 | 900 | 1414 | 1.57 |
26-Apr-10 | 660 | 1143 | 1.73 |
09-Jun-10 | 660 | 1118 | 1.69 |
20-Aug-10 | 300 | 406 | 1.35 |
30-Mar-11 | 600 | 1000 | 1.66 |
06-oct-11 | 600 | 1200 | 2 |
26-Jan-12 | 600 | 1053 | 1.75 |
04-Aug-14 | 600 | 1200 | 2 |
19-July-16 | 600 | 1200 | 2 |
Chromium Deposition
Results for Denton E14 Chromium deposition monitoring with Recipe CR-MON Pressure = 5 mTorr DC2 = 1 Amperes RS = 50% Heat = NO Measurement Method = Profilometry of resist pen test on glass slide
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) |
---|---|---|---|
2011-03-24 | 600 | 3500 | 5.8 |
Al Deposition using RF cathode
Recipe: Pressure = 8 mTorr RF = 400W RS = 50% Heat = NO Measurement Method = Profilometry of resist pen test on glass slide
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) |
---|---|---|---|
2016-04-08 | 600 | 1100 | 1.8 |
Ag Deposition using RF cathode
Recipe: Pressure = 15 mTorr RF = 400W RS = 50% Heat = NO Measurement Method = Profilometry of resist pen test on glass slide
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) |
---|---|---|---|
2016-05-30 | 1000 | 6000 | 6 |
Ag Deposition using RF cathode
Recipe: Pressure = 10 mTorr RF = 200W RS = 50% Heat = NO Measurement Method = Profilometry of resist pen test on glass slide
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) |
---|---|---|---|
2016-07-19 | 1200 | 4200 | 3.5 |
Mo Deposition
Recipe: Recipe CR-MON Pressure = 10 mTorr DC2 = 1.1 Amperes RS = 50% Heat = NO Measurement Method = Profilometry of resist pen test on glass slide
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) |
---|---|---|---|
2012-08-01 |
ITO Deposition
Recipe ITOCOLD P = 4.9 mT RF Source= 200W Bias Forward Power = 20 W Heat = No RS = 50%. O2/Ar= 3/100 (gas flow: ~1.4/70.4sccm) Measurement Method = Profilometry of Resist pen on glass slide. 4PP = manual 4point probe.
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) | 4PP (ohm/sq) | Comments |
---|---|---|---|---|---|
28-Aug-09 | 1000 | 623 | 0.62 | ||
9-Jun-10 | 1600 | 983 | 0.61 | ||
18-Jun-10 | 1600 | 2700 | 1.69 | Reflected RF minimized | |
20-Aug-10 | 600 | 1062 | 1.77 | 150 | |
12-Jun-11 | 2400 | 3586 | 1.52 | 30-36 | |
06-Aug-12 | 650 | 1250 | 1.92 | 125 | |
09-Jun-2016 | 1000 | 1270 | 1.27 |
ecipe ITO-20-OHMS P = 4.9 mT RF Source= 200W Bias Forward Power = 20 W Heat = 300C RS = 50% O2/Ar: 2%Measurement Method: deposit on a Si`SiO2 and a glass sample=> Ellipsometry on Si/SiO2 sample for thickness. 4PP = manual 4point probe on glass for Sheet resistance. Photometryon glass for transmission spectra.
DATE | DEP TIME (sec) | DEP THICKNESS (A) | RATE (A/sec) | 4PP (ohm/sq) | Transmission Spectra | Comments |
---|---|---|---|---|---|---|
9-Jun-2011 | 2400 | 3668+-10 | 1.52 | 10-12 | graph | |
16-Jun-2011 | 2400 | 3233 | 1.34 | 17-21 | ||
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