General information
Semiconductor physics
Photolithography
E-beam lithography
- CASINO V2.42-A Fast and easy-touse Modeling Tool for Scanning Electron Microscopy and Microanalysis Users
- Electron beam lithography of nanostructures using 2-propanol:water and 2-propanol:methyl isobutyl ketone as developers for poly-methylmethacrylate
- Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography
Wet/dry etching of materials
- Anistropic etching of crystalline silicon in alkalyne solutions I. Orientation dependance and behavior of passivation layers
- Anistropic etching of crystalline silicon in alkalyne solutions II. Influence of dopants
- Etch rates for micromachining processing, part 1
- Etch rates for micromachining processing, part 2
- Guide to references on III-V semiconductor chemical etching
List of online calculators
|
# |
CALCULATOR WEB SITE |
DESCRIPTION |
|---|---|---|
|
1 |
Thermal Oxide Thickness, Film Stress |
|
|
2 |
www.mrhackerott.org/semiconductor-informatics/informatics/toolz/DPWCalculator/Input.html |
Die Per Wafer |
|
3 |
Units Conversions |
|
|
4 |
Humidity Parameters |
|
|
5 |
www.angstromsciences.com/reference/pressure-conversion/index.html?ID=7 |
Pressure Units Conversions |
|
6 |
www.angstromsciences.com/reference/sputtering-yields/index.html?ID=8 |
Sputtering Yields |
|
7 |
Optical Coatings |
|
|
8 |
Silicon Resistivity vs. Dopant Concentration |
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