Solvent Clean

Solvents can clean oils and organic residues that appear on surfaces. Unfortunately, solvents themselves (especially acetone) leave their own residues. This is why a two-solvent method is used. The procedure is done using an ultra-sonic bath that helps remove dust and particles from the wafer(s)/sample(s) surface.


This document describes the standard operating procedure for this cleaning procedure.
This document is NOT sufficient training; it is a reference document. Users have to go through regular wet bench training to be allowed to use this procedure.

Associated Documents & References

  • Rules and safety procedures regarding chemical use.
  • MSDS: acetone and isopropyl alcohol.
  • General Wet Processing SOP

Equipment Used

  • Solvent Wet Bench located in the Etch/Dep room.
  • 2 glass dishes
  • Ultra-Sonic bath.
  • Chemicals:
    • Acetone. Location: under Solvent wet bench
    • Isopropyl alcohol (IPA). Location: under Solvent wet bench

This equipment must be reserved through the online software: Resource Scheduler.

If you need to be assisted by technicians check availability with them before reserving the equipment. Users have to go through regular training before using this equipment alone.

Verifications Prior to Processing

Operations description

  1. Set the ultrasonic bath to 5 min and ultra-sonic power : 100%. The temperature of the bath must be below 30 °C and the heater must be off.
  2. Pour the acetone in the first beaker and soak the wafer(s)/sample(s) in it. Cover the beaker to limit acetone evaporation if possible.
  3. Place the beaker in the ultrasonic bath for 5 min.
  4. Meanwhile prepare a beaker of IPA.
  5. When the ultrasonic cycle is done, remove the wafer(s)/sample(s) from the acetone and soak them in IPA for 5 min.
  6. Remove the wafer(s)/sample(s) from IPA and start a DIW rinse.
  7. Nitrogen dry.
  8. Get rid of the solvent wastes in the dedicated white container that is in the yellow flammable cabinet. If the container is full, call staff.